摘要
The great application potential of terahertz (THz) waves in communication, imaging, and other cutting-edge fields makes them vulnerable to harsh environments. THz electromagnetic interference (EMI) shielding materials that are applicable in capable of with standing harsh environments are critically important for ensuring the reliable operation of electronic devices and are urgently needed. Herein, UV light-cured SiC whisker (SiCw)@MXene/SiOC composites with different SiCw:MXene mass ratios are developed through electrostatic self-assembly. The influence of MXene exfoliation routes and SiCw:MXene mass ratios on the THz EMI shielding performance of SiCw@MXene/SiOC are investigated in deep. The results indicated that SiCw@HF-MXene/SiOC with the SiCw:MXene mass ratio of 1:1 exhibited the best THz EMI shielding performance, and the abundant heterointerfaces formed between SiCw and MXene enhanced THz wave attenuation. Subsequently, SiCw@MXene/SiOC Gyroid triple periodic minimal surface (TPMS) metastructures are fabricated by vat photopolymerization (VPP) 3D printing. All of the obtained metastructures with a thickness of 1.3–2.7 mm exhibited superior THz EMI shielding properties with an average shielding efficiency (SE) of 58.6–66.4 dB in 0.2–1.6 THz. Moreover, the developed Gyroid-2.5 metastructure even exhibited low thermal conductivity and electron-to-thermal conversion properties. The developed Gyroid metastructure facilitates the development of next-generation THz EMI shielding materials in harsh environments.
源语言 | 英语 |
---|---|
文章编号 | 2500970 |
期刊 | Advanced Functional Materials |
卷 | 35 |
期 | 30 |
DOI | |
出版状态 | 已出版 - 24 7月 2025 |
已对外发布 | 是 |